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Extensive band gap tunability in covalent organic frameworks via metal intercalation and high pressure

Michelle Ernst1*, Jürg Hutter2*, Stefano Battaglia2*

1 Institute of Geological Sciences, University of Bern, Baltzerstrasse 1+3, 3012 Bern, Switzerland

2 Department of Chemistry, University of Zurich, 8057 Zürich, Switzerland

* Corresponding authors emails: michelle.ernst@unibe.ch, hutter@chem.uzh.ch, stefano.battaglia@chem.uzh.ch
DOI10.24435/materialscloud:yw-3f [version v1]

Publication date: Apr 22, 2025

How to cite this record

Michelle Ernst, Jürg Hutter, Stefano Battaglia, Extensive band gap tunability in covalent organic frameworks via metal intercalation and high pressure, Materials Cloud Archive 2025.63 (2025), https://doi.org/10.24435/materialscloud:yw-3f

Description

Covalent organic frameworks (COFs) are materials of growing interest for electronic applications due to their tunable structures, chemical stability, and layered architectures that support extended π-systems and directional charge transport. While their electronic properties are strongly influenced by the choice of molecular building blocks and the stacking arrangement, experimental control over these features remains limited, and the number of well-characterized COFs is still relatively small. Here, we explore two alternative strategies, hydrostatic pressure and metal intercalation, to tune the electronic structure of COFs. Using periodic density functional theory (DFT) calculations, we show that the band gap of pristine COF-1 decreases by ∼1 eV under compression up to 10 GPa. Metal intercalation induces an even greater reduction, in some cases leading to metallic behavior. We demonstrate that pressure and intercalation offer effective, continuous control over COF electronic properties, providing powerful means to complement and extend conventional design approaches.

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File name Size Description
MaterialsCloudArchive.tar.gz
MD5md5:4e4683ca2ffe48736b8ab1f58c4552b4
53.4 MiB Inputs and output of CP2K calculations sorted by COF and pressure.

License

Files and data are licensed under the terms of the following license: Creative Commons Attribution Share Alike 4.0 International.
Metadata, except for email addresses, are licensed under the Creative Commons Attribution Share-Alike 4.0 International license.

External references

Preprint (Preprint where the data is discussed)

Keywords

MARVEL Swiss National Supercomputing Center (CSCS) covalent-organic frameworks DFT electronic bands band gap high pressure intercalation

Version history:

2025.63 (version v1) [This version] Apr 22, 2025 DOI10.24435/materialscloud:yw-3f