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Publication date: Jun 21, 2024
The intrinsic stress in nanomultilayers (NMLs) is typically dominated by interface stress, which is particularly high in immiscible Cu/W NMLs. Here, atomistic simulations with a chemically-accurate neural network potential reveal the role of interfacial intermixing and metastable phase formation on the interface stress levels. These results rationalize an experimentally-reported compressive-to-tensile transition as a function of NML deposition conditions and the extremely high interface stresses under some conditions.
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File name | Size | Description |
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inter_stress.zip
MD5md5:88ed82cc3e0b973cedbe73418374edf1
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8.8 MiB | Experimental and modeling data supporting the research work. The corresponding readme files are provided inside the archives. |
2024.92 (version v1) [This version] | Jun 21, 2024 | DOI10.24435/materialscloud:8a-gh |